Rendering SiO2/Si surfaces omniphobic by carving gas-entrapping microtextures comprising reentrant and doubly reentrant cavities or pillars

by Arunachalam, S., Domingues, E. M., Das, R., Nauruzbayeva, J., Buttner, U., Syed, A., and Mishra, H.*.
Year: 2019

Bibliography

Rendering SiO2/Si surfaces omniphobic by carving gas-entrapping microtextures comprising reentrant and doubly reentrant cavities or pillars.
Arunachalam, S., Domingues, E. M., Das, R., Nauruzbayeva, J., Buttner, U., Syed, A., and Mishra, H.*. Journal of visualized experiments, 2019. (Under review)

Keywords

Wetting omniphobicity Reentrant and doubly reentrant cavities/pillars Gas-entrapping microtextures (GEMs) Photolithography Isotropic etching Anisotropic etching Thermal oxide growth Reactive-ion etching Contact angles Immersion