Rendering SiO2/Si surfaces omniphobic by carving gas-entrapping microtextures comprising reentrant and doubly reentrant cavities or pillars (Journal of Visualised Experiments)
Year:
2020
Authors:
Arunachalam, S., Domingues, E. M., Das, R., Nauruzbayeva, J., Buttner, U., Syed, A., and Mishra, H.*.
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Wetting
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omniphobicity
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Reentrant and doubly reentrant cavities/pillars
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Gas-entrapping microtextures (GEMs)
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Photolithography
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Isotropic etching
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Anisotropic etching
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Thermal oxide growth
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Reactive-ion etching
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Contact angles
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Immersion